Renatech > Intervenants Renatech

Intervenants RENATECH (cf programme) :

Mardi 26/11

Rémi Courson, LAAS

Material and process development for high resolution 3D printing

Abstract

Laurent Travers, C2N

In-situ observation in a TEM of the MBE growth of III-V and II-VI semiconductor nanostructures

Abstract

Laurent Markey, ICB

Plasmonic and hybrid plasmo-photonic integrated waveguide technologies

Abstract

 

Mercredi 27/11

Bernard Pélissier, LTM

The IMPACT Project and Platform : “quasi insitu” analyses and multipurpose advanced characterizations for materials studies, merging academic research and industrial applications

Abstract

Personnes connectées : 1